Oxford Instruments plc Declares Dividend of GBX 5.10 (LON:OXIG)

Oxford Instruments plc (LON:OXIG) declared a dividend on Tuesday, November 12th,Upcoming Dividends.Co.Uk reports. Shareholders of record on Thursday, November 28th will be given a dividend of GBX 5.10 ($0.07) per share on Friday, January 10th. This represents a yield of 0.24%. The ex-dividend date is Thursday, November 28th. The official announcement can be accessed at this link.

Oxford Instruments Stock Down 0.5 %

Shares of LON:OXIG opened at GBX 2,075 ($26.70) on Thursday. The company has a quick ratio of 1.11, a current ratio of 1.64 and a debt-to-equity ratio of 12.96. The company has a market capitalization of £1.20 billion, a P/E ratio of 2,424.42, a P/E/G ratio of -3.56 and a beta of 0.96. Oxford Instruments has a 52-week low of GBX 1,932 ($24.86) and a 52-week high of GBX 2,765 ($35.58). The stock’s fifty day simple moving average is GBX 2,094.33 and its 200-day simple moving average is GBX 2,306.46.

Wall Street Analyst Weigh In

A number of research firms have issued reports on OXIG. Berenberg Bank reduced their target price on shares of Oxford Instruments from GBX 2,925 ($37.64) to GBX 2,830 ($36.42) and set a “buy” rating on the stock in a report on Tuesday. Shore Capital reissued a “buy” rating on shares of Oxford Instruments in a research note on Wednesday, October 16th.

About Oxford Instruments

Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.